News Center
cf4 density sensor for 121kv

cf4 density sensor for 121kv

2010-12-24Typical test data Grade CF4 CF5 CF6 CF7 900 300 Thickness (μm 53 kPA) 482 954 1370 1873 1830 2590 Wicking rate (s/4 cm) 65 75 65 35 34 32 Water absorption (mg/cm2) 46 98 128 198 204 240 Grade Pore size (μm) Caliper (μm) Protein binding (μm lgG/cm2

[email protected]
News Detail
  • Highly Sensitive and Selective Sensors for CF4 Gas

    CF 4 sensor is irrelevant to the orientation of and their performance for sensing greenhouse gas molecule CF4, by density functional theory combined with nonequilibrium Greens function

    Get Price
  • Highly Sensitive and Selective Sensors for CF4 Gas

    film as a gas sensor for NO 2 detection. Similarly, Pham et al., the calculated charge density difference, which is defined as CF4 molecules, i.e., how the encapsulation of small molecules

    Get Price
  • Carbon tetrafluoride | CF4 - PubChem

    The amount of adsorbed CF4 strongly depends on the pore size in nanotubes; at 1 bar the most efficient nanotubes for volumetric storage have size R = 0.68 nm. This size corresponds to the (10,10)

    Get Price
  • High-Precision Density Sensor for Concentration

    2012-1-1Procedia Engineering 47 ( 2012 ) 44 – 47 1877-7058 2012 The Authors. Published by Elsevier Ltd. Selection and/or peer-review under responsibility of the Symposium Cracoviense Sp. z.o.o. doi: 10.1016/j.proeng.2012.09.080 Proc. Eurosensors XXVI, September 9-12, 2012, Kraków, Poland High-precision density sensorCited by: 2

    Get Price
  • 瑞士TRAFAG SF6混合气体密度继电器

    Translate this page2017-6-6瑞士TRAFAG SF6混合气体密度继电器 CF4混合气体密度控制器 SF6.pdf,SF GaS DenSity Monitor 6 Unique SF monitoring with reference gas comparison 6 excellent accuracy over wide temperature range no false alarms at

    Get Price
  • High-precision density sensor for concentration

    2013-11-1A pre-requisite for highly precise concentration readings with a (pTρ)-sensor system is a high absolute density measurement accuracy which we realized by an empirical temperature compensation.The density sensor consists of two identical microcrystal tuning forks of resonance frequency f = 2 15 Hz = 32,768Cited by: 11

    Get Price
  • Effects of CF4 Plasma Treatment on pH and pNa

    We investigated the effect of the carbon tetrafluoride (CF4) plasma treatment on pH and pNa sensing characteristics of a light-addressable potentiometric sensor (LAPS) with a 2-nm-thick HfO2 film

    Get Price
  • In-situ UV absorption CF2 sensor for reactive ion

    In-situ UV absorption CF2 sensor for reactive ion etch process control to the etch rate of SiO2 and a-Si in CF4/CHF3 plasmas. decrease in a number density of the ground state fluorine and

    Get Price
  • Aerospace Applications for Surface Acoustic Wave

    2020-8-6VSST Wireless OFC SAW Sensor Goal-Goal is to develop a passive wireless sensors for Aerospace Applications -(temperature, strain, load, fatigue, fastener failure, impact sensors, etc.)-OFC allows for many uniquely coded sensor to be interrogated at once.-Envision hundreds of SAW devices mounted dir ectly to

    Get Price
  • 等离子技术-培训_图文_百度文库

    Translate this pagewenku.baidu.com›百度文库›互联网2016-2-25and CF4 H – Ionized Source Chemical Produces Reactive Species – Gas Phase Products Produced From Reactions with Conveyor Belt w/ Pinch Wheels Bridges Servo Driven Pusher Fiber-optic Sensor User Interface: PC w/ Touchscreen,Mouse

    Get Price
  • Sensitive Detection of H2S Using Gold Nanoparticle

    2021-3-12Plot of ln R vs 1/T for low density Au deposit case; response of a high density deposit case sensor to H 2 S. Sensing of NH 3 and H 2 S by carboxylated and Au-SWNT sensors. Comparison of as-prepared sensor response (25 ppb H 2 S in air) and sensor response after 6 months of storage.

    Get Price
  • In-Situ UV Absorption CF2 Sensor for Reactive Ion

    2005-6-23In-Situ UV Absorption CF2 Sensor for Reactive Ion Etch Process Control the etch rate of Si02 and a-Si in CF4/CHF3 plasmas. We present statistical models for estimation of a-Si etch rate the CF2 density in this plot is in the range of 2.6x103 cm3 7.OxlO3cm3. For 40 mT total gas pressure, the

    Get Price
  • 衍射光学元件来实现超过衍射极限的极小

    Translate this pagewenku.baidu.com›百度文库›高校与高等教育For CCG to be used in integrated SPR sensor, NA should be high enough to ensure that the angular spectrum of the focused light covers the desired range of operation as defined in Eqn. (c) (d) Fig. 4. The schematic of the double patterning (Litho-Etch-Litho-Etch,LELE) technique with shifting the pattern position.

    Get Price
  • Read Expanding the Vision of Sensor Materials at

    2021-3-13The sensor consists of a silicon base, a thin silicon dioxide insulating layer, and a metallic outer layer that catalytically decomposes H2 or other hydrogen-containing molecules. The initial

    Get Price
  • Design, Simulation, Fabrication and Characterization

    standard density and viscosity calibration, 4 different gases (N2, CO2, Ar and He) are meas-ured at temperatures between 0 and 60 &C and pressures between 1 and 10 bar abs. The measuring performance of the sensor is shown in Fig. 5. We can measure the gas density with an abs. accuracy <0.03 kg/m3 and the dynamic

    Get Price
  • Precise and robust quartz sensor based on tuning fork

    Download Citation | Precise and robust quartz sensor based on tuning fork technology for (SF6)-gas density control | A novel sensor technology for measuring and monitoring gas density is described

    Get Price
  • Platinum-Doped Anatase (101) Surface as Promising Gas

    2021-1-12In order to find promising sensor materials for HF, CS2, and COF2 detection to realize the online internal insulation defect diagnosis of a SF6 gas electrical device, the gas sensing property, binding energy, adsorption distance, charge transfer, and density of states distribution, of Pt-doped anatase TiO2 (101)Author: Zhengqin Cao, Wei Li, Qiang Yao, Haiyan Zhang, Gang Wei

    Get Price
  • Whatman Diagnostic Catalog 2010_百度

    Translate this pagewenku.baidu.com›百度文库›互联网2010-12-24Typical test data Grade CF4 CF5 CF6 CF7 900 300 Thickness (μm @ 53 kPA) 482 954 1370 1873 1830 2590 Wicking rate (s/4 cm) 65 75 65 35 34 32 Water absorption (mg/cm2) 46 98 128 198 204 240 Grade Pore size (μm) Caliper (μm) Protein binding (μm lgG/cm2

    Get Price
  • The Dry Etching of TiN Thin Films Using Inductively

    2018-12-27density plasma. The bottom electrode was connected to another 13.56 MHz asymmetric RF generator, to control the DC-bias volt-age. The distance between a quartz window and substrate elec-trode was 9 cm. The chamber was evacuated to 10-6 Torr using a mechanical pump (2M80, BOC Edwards), and a

    Get Price
  • 上海交通大学-电子信息与电气工程学院

    Translate this page2021-1-22air coil sensor technique for on-line partial discharge measurement of power cables,” IET Yin, X. B. Dong, D.M. Xizo, “Effect of electrical stressing history on slow polarization behavior in composite of low-density

    Get Price
  • Magnesium Oxide (MgO) pH-sensitive Sensing

    Magnesium oxide (MgO) sensing membranes in pH-sensitive electrolyte-insulator-semiconductor structures were fabricated on silicon substrate. To optimize the sensing capability of the membrane, CF4

    Get Price
  • Enhanced piezoelectric tactile sensing behaviors of high

    High-density CF 4 plasma is realized by an inductively coupled plasma (ICP) system.. Low-damage CF 4 plasma is carried out by ICP with a quartz filter.. Plasma-fluorinated IGZO films coated by P(VDF-TrFE) are materially analysed. • An enhancement in μ FE and I DS and a negative shift in V t of IGZO TFTs areAuthor: Jer-Chyi Wang, Jer-Chyi Wang, Jer-Chyi Wang, Yi-Pei Jiang, Chi-Hung Lin, Shun-Hsiang Chan, Ming-Chun...

    Get Price
  • High density plasma etching of ultrananocrystalline

    2020-1-27Inductively coupled plasma etching of ultrananocrystalline diamond (UNCD) films was performed in O2/CF4 and O2/SF6 discharges. Higher etch rates were produced for the O2/SF6 discharges and the film...Author: Jong Cheon Park, Seong Hak Kim, Tae Gyu Kim, Jin Kon Kim, Hyun Cho, Byeong Woo Lee

    Get Price
  • Surface acoustic wave sensor - Wikipedia

    2021-2-16Surface acoustic wave sensors are a class of microelectromechanical systems (MEMS) which rely on the modulation of surface acoustic waves to sense a physical phenomenon. The sensor transduces an input electrical signal into a mechanical wave which, unlike an electrical signal, can be easily influenced by

    Get Price
  • Innovative plasma diagnostics and control of process in

    1998-1-1The experiments in CF4 and SF6 were performed in the same rf power range. As can be seen in Fig. 4, the relations of bias voltage and electron density are completely different. The well-known reason is the large number of negative ions resulting in a completely different axial density profile in the bulk plasma.

    Get Price
  • 刘永新 - 大连理工大学 - 物理学院

    Translate this page个人简介 刘永新,1985 年生,国家优秀青年基金获得者,大连理工大学“星海杰青”。 2017.12-今, 大连理工大学 教授 2016.12-2017.12,大连理工大学 副教授 2016.03-2017.04,美国休斯顿大学 访问学者 2013.10-2016.12,大连理工大学 讲师 长期从事低气压射频等离子体的实验诊断与计算机模拟研究工作。

    Get Price
  • Materials | Free Full-Text | Comparison of SF6 and CF4

    The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was analysed by X-ray photoelectron spectroscopy

    Get Price
  • Design and Synthesis of Nanostructured Materials for

    There has been an increasing demand for the development of sensor devices with improved characteristics such as sensitivity, low cost, faster response, reliability, rapider recovery, reduced size, in situ analysis, and simple operation. Nanostructured materials have shown great potential in improving these properties for chemical

    Get Price
  • 高飞 - 大连理工大学 - 物理学院

    Translate this page[1] 高飞,王友年.Experimental investigation of the electron impact excitation behavior in pulse-modulated radio frequency Ar/O2 inductively coupled plasma[J],J. Appl. Phys.,2019,125:23303-23303 [2] 左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击

    Get Price
  • 最新研究进展 -MedSci.cn 相关研究进展

    Translate this pageScanning electron microscopy and Raman spectroscopy showed that the VACNTs remained intact alignment after CF4 plasma treatment, but the defects and amorphous carbon increased with increasing time. X-ray photoelectron spectroscopy showed that various functional groups were introduced with increasing time, such

edge-iconRelated News
toTop
Click avatar to contact us
Chat Online