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cf4 density sensor for Hitachi

cf4 density sensor for Hitachi

The size of MR sensor 100 and the number of layers forming MR sensor 100 is a problem for higher density magnetic recording devices. Particularly, the size of AFM pinning layer 106 is a problem, because AFM pinning layer 106 requires a large fraction of the space on MR sensor 100 and causes parasitic resistance in the read

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  • Highly Sensitive and Selective Sensors for CF4 Gas

    CF 4 sensor is irrelevant to the orientation of and their performance for sensing greenhouse gas molecule CF4, by density functional theory combined with nonequilibrium Greens function

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  • Clean Solution System : Hitachi High-Tech GLOBAL

    Hitachi High-Tech Clean Solution Highly uniform and high density plasma can be generated by our unique ICP technology. A wide variety of plasma sources can be used for multiple purposes. (CF4+O2 gas) Before cleaning. After cleaning. Vacuum plasma Finger print sensor Descum (CF4+O2 gas)

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  • Highly Sensitive and Selective Sensors for CF4 Gas

    film as a gas sensor for NO 2 detection. Similarly, Pham et al., the calculated charge density difference, which is defined as CF4 molecules, i.e., how the encapsulation of small molecules

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  • Clean Solution System : 日立先端科技在台

    Translate this page真空電漿 ABF材(使用氣體CF4+O2) 清潔前 清潔後 真空電漿 指紋Sensor Descum(使用氣體CF4+O2) 案例 : 表面改質案例 大氣電漿 (使用氣體CDA) Return to the Top of Page Industrial IT Systems ICT Solutions Previous Page Brochure Request Info Print

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  • High-power-density Inverter Technology for - Hitachi

    2015-3-31Hitachi Review Vol. 63 (2014), No. 2 96 - 41 - High-power-density Inverter Technology for Hybrid and Electric Vehicle Applications Takashi Kimura Ryuichi Saitou Kenji Kubo Kinya Nakatsu Hideaki Ishikawa Kaname Sasaki OVERVIEW: Green vehicles have become familiar sights on the road in

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  • High-Precision Density Sensor for Concentration

    2012-1-1Procedia Engineering 47 ( 2012 ) 44 – 47 1877-7058 2012 The Authors. Published by Elsevier Ltd. Selection and/or peer-review under responsibility of the Symposium Cracoviense Sp. z.o.o. doi: 10.1016/j.proeng.2012.09.080 Proc. Eurosensors XXVI, September 9-12, 2012, Kraków, Poland High-precision density sensorCited by: 2

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  • High-precision density sensor for concentration

    2013-11-1A pre-requisite for highly precise concentration readings with a (pTρ)-sensor system is a high absolute density measurement accuracy which we realized by an empirical temperature compensation.The density sensor consists of two identical microcrystal tuning forks of resonance frequency f = 2 15 Hz = 32,768

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  • Hitachi Metals, Ltd.

    2021-2-8At Hitachi Metals, we have fortified unique development and technological strengths in our two business divisions of Advanced Metals, and Advanced Components and Materials. We will continue

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  • Technology for Measuring the - Hitachi Global

    2020-5-25Figure 3: Magnetic-field sensor for experimental tests. FUNATO In recent times, the question If the part for detecting the magnetic field is covered by a certain amount, to what extent will doing so reduce the effect of the electric field? has not been clearly answered. Accordingly, to grasp the relation between the

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  • Sensors and Actuators B: Chemical

    2021-1-7the PHF sensor was investigated by Hitachi SU-8000 field emission scanning electron microscope (SEM). The cyclic voltammetry (CV) and amperometric response (I-t) were recorded using CHI660 electro-chemical workstation with a three-electrode system. Ag/AgCl and pla-tinum wire were used as the reference

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  • Hitachis Overseas Research on Hard Disk Drive

    2015-3-31Hitachi’s Overseas Research on Hard Disk Drive 150 but demand is still growing for larger capacities, faster performance and enhanced features. The recording density for data on the surface of the disk has increased 60,000,000-fold in those 50 years and placed tremendous challenges on all In 1991 a more sensitive sensor…

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  • A novel fused sensor for photo- and ion-sensing

    2005-5-13A novel sensor device, comprising of fused photo-sensors and ion-sensors, is proposed. We describe how a prototype device was successfully fabricated using a CMOS process. In the proposed device, a photo-sensor and an ion-sensor are fused in the same pixel, enabling the photo-signal and the ion concentration density

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  • Carbon tetrafluoride | CF4 - PubChem

    The amount of adsorbed CF4 strongly depends on the pore size in nanotubes; at 1 bar the most efficient nanotubes for volumetric storage have size R = 0.68 nm. This size corresponds to the (10,10)

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  • MASS AIR FLOW SENSOR (MAF) - Autoditex

    A mass air flow (MAF) sensor responds to the amount of air flowing through a chamber containing the sensor. It is intended to be insensitive to the density of the air. The sensor for volume consumption of air is used in many systems for management of engines for measuring value of the transitory cost of air.

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  • WXMS Smart Moisture Sensor User Guide

    2020-12-21The density of the surrounding soil will influence the measurement signal 6. Ensure the sensor is installed in undisturbed soil 7. Ensure the sensor is placed in a location where there is minimal disturbance to roots and plants 8. Ensure the sensor location is in an average location of the climate conditions of the area

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  • Intelligent Differential Pressure - Hitachi High-Tech

    The Hitachi intelligent differential pressure / pressure transmitter N7 series can be used to measure flow rate of the liquids, gas and steam, and level and pressure of tanks. It is compact, lightweight, and boasts of a high-performance.

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  • DK23EA-30中文资料_百度文库

    Translate this pagewenku.baidu.com›百度文库›互联网元器件交易网www.cecb2b.com 2.5 inch ATA-5 hard disk drives Capacities: 20, 30, 40 60 GB Hitachi Travelstar DK23EA / DK23EB hard disk drives Highlights ? 20, 30, 40 or 60 GB 4200 RPM in 9.5mm high package for

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  • 2020:Publications : Research Development : Hitachi

    2021-2-5Mechanism of premature etch stop in high-density magnetic-tunnel-junction patterning using CO/NH3 plasma with Ta mask Journal of Vacuum science Technology B Vol. 38 No.4 042805 Development of Noise Correction Method of Environmental Magnetic Field with Reference Magnetic Sensor for

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  • Products | Hitachi Metals, Ltd.

    2021-3-5Materials that shapes a future. Hitachi Metal shapes a future with highly functional and vital materials for EV evolution, such as magnets essential for the energy saving of motors, clad materials that contribute to the large capacity of batteries, copper wires having the same characteristics as those of high purity

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  • Magnesium Oxide (MgO) pH-sensitive Sensing

    Magnesium oxide (MgO) sensing membranes in pH-sensitive electrolyte-insulator-semiconductor structures were fabricated on silicon substrate. To optimize the sensing capability of the membrane, CF4

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  • Enhanced piezoelectric tactile sensing behaviors of high

    Enhanced piezoelectric tactile sensing behaviors of high-density and low-damage CF4-plasma-treated IGZO thin-film transistors coated by P(VDF-TrFE) copolymers April 2020 Sensors and Actuators A

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  • In-Situ UV Absorption CF2 Sensor for Reactive Ion

    2005-6-23In-Situ UV Absorption CF2 Sensor for Reactive Ion Etch Process Control the etch rate of Si02 and a-Si in CF4/CHF3 plasmas. We present statistical models for estimation of a-Si etch rate the CF2 density in this plot is in the range of 2.6x103 cm3 7.OxlO3cm3. For 40 mT total gas pressure, the

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  • Conductor Etch System M-600/6000 Series : Hitachi

    Conductor Etch System M-600/6000 Series is targeted for deep silicon trench etch of power devices used in mobile systems, home electrical appliances, automobiles, trains, etc.

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  • Methods of fabricating magnetoresistance sensors

    The size of MR sensor 100 and the number of layers forming MR sensor 100 is a problem for higher density magnetic recording devices. Particularly, the size of AFM pinning layer 106 is a problem, because AFM pinning layer 106 requires a large fraction of the space on MR sensor 100 and causes parasitic resistance in the read

    Get Price
  • Dry etching and residue removal of functional

    In addition, the PIM-based sensor is insensitive to temperature (0-95 &C) and pressure (0-6.8 kPa) change, which indicates that it can be used as highly selective flexible humidity sensor.

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  • Materials | Free Full-Text | Plasma Parameters and

    In this work, we carried out the study of CF4 + O2 + X (X = C4F8 or CF2Br2) gas chemistries in respect to the SiOxNy reactive-ion etching process in a low power regime. The interest in the liquid CF2Br2 as an additive component is motivated by its generally unknown plasma etching performance. The combination of various

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  • Read Expanding the Vision of Sensor Materials at

    2021-3-13The sensor consists of a silicon base, a thin silicon dioxide insulating layer, and a metallic outer layer that catalytically decomposes H2 or other hydrogen-containing molecules. The initial

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  • Adsorption behavior of COF2 and CF4 gas on the MoS2

    CF 4 and COF 2 are the two main decomposition products of fluorocarbon gas insulating medium. We explored the gas sensing properties of Ni-MoS 2 to CF 4 and COF 2 based on the density functional theory calculations. The adsorption energy, charge transfer, density of states and electron density difference have been

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  • Output voltage characteristics and magnetic field analysis

    1995-1-1This paper describes the operation of a magnetic defect sensor in the early detection of damage to escalator - handrails. We perform a magnetic field analysis by using the finite element method (FEM) in order to determine the output voltage by calculation. The measured and calculated values exhibit a relatively

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