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sf6 o2 Vacuum for sieyuan

sf6 o2 Vacuum for sieyuan

Pure SF6 is physiologically completely harmless for humans and animals; it's even used in medical treatment. Due to its weight it might displace the oxygen in the air, if large quantities are concentrating in deeper and non ventilated places. Legislation for

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  • /56/ -Sieyuan Electric Co., Ltd.

    2021-2-5SF6 of ZF28-550 style gas insulated switchgear. Cases. Cases. more. Industry trends. GIS . SF6 of ZF28-550 style gas insulated switchgear. About Sieyuan. About Sieyuan. Sieyuan Electric Co., Ltd. (hereinafter referred to as Sieyuan Electric ) more. Company profile. Corporate Culture it is carried out advanced vacuum drying and vacuum

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  • Circuit breaker -Sieyuan Electric Co., Ltd.

    2021-3-14Sieyuan Electric Co., Ltd. (hereinafter referred to as Sieyuan Electric ) more. Company profile. Corporate Culture. Live Tank Vacuum Circuit Breakers (40.5 kv) Live Tank SF6 Circuit breakers LW36 (123-145 kV)

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  • /54/ -Sieyuan Electric Co., Ltd.

    2021-2-5Live Tank SF6 Circuit breakers LW58 (252 kV) Configurable for all applications and environments(useing in reactive power compensation loop) LW58 is a combined apparatus including an SF6 live tank circuit breaker with self-blast arc extinction and double acting technology.The circuit breakers are available for

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  • /54/ -Sieyuan Electric Co., Ltd.

    2021-2-5Live Tank SF6 Circuit breakers LW36 (40.5 kV) Without CT or with integrated CT(Inside or outside installation) LW36 is a combined apparatus including an SF6 circuit breaker with self-blast arc extinction technology. The circuit breakers are available for single or three pole operation by spring operating

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  • /54/ -Sieyuan Electric Co., Ltd.

    2021-2-5CT integrated outside LW58A is a combined apparatus including a SF6 dead tank circuit breaker with self-blast arc extinction.The circuit breakers are available for single or three pole operation,It is used to break rated current, fault current, or to switch electric lines, and thus realizes the controlling and protection

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  • Experimental investigation of SF6–O2 plasma for

    2019-3-19This study examines the impact of varying the internal process parameters, such as the concentrations of oxygen and fluorine in a SF 6 –O 2 plasma, in two capacitively coupled plasma etch chambers with different geometries. Silicon wafers were used to investigate the anisotropic nature of etch profiles. The oxygenCited by: 2

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  • Electron Density and Optical Emission Measurements

    2018-12-1as oxygen was added to the SF6 discharge, reached their maximum at an O2 fraction of 20% and then decreased with further addition of oxygen. The plasma electron density was also strongly in&uenced by the addition of O2. Keywords: OES, hairpin probe, SF6, O2, electron density, atomic &uorine PACS: 52.70.-m DOI:

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  • /54/ -Sieyuan Electric Co., Ltd.

    2020-10-22Rated voltage:123-252kV Rated current: 4000A Rated frequency:50/60Hz Rated Breaking current:up to 50kA Rated operating sequence:O-0.3s-CO-3min-CO Partial discharge:≤5pC Insulator material:Compesite( silicone rubber ) Rated insulation level:According to the

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  • Comparison Between Vacuum and SF6 Circuit Breaker

    2018-8-29Today, the SF6 and vacuum circuit-breakers made use of the same operating mechanisms, so in this regard they can be considered identical. However, in relation to their interrupters the two circuit breakers exhibit a marked difference. The number of moving parts is higher for the SF6 circuit-breaker than that for the vacuum

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  • Oxidation of sulfur hexafluoride - ScienceDirect

    Metal explosions in SF6 and oxygen* Reaction Relative extent of reaction (per cent)t 0.1 mg Pt 3 mg Cu SF6+2 --- SOF4 + F2 53 46 SF6+2 --- SOF2 + 2F2 33 38 SF6+O2 -- SO2Fz + 2F2 12 14 SF6 + 02 --- SO2 + 3F2 1.4 1-9 *In all runs the initial SE6 and oxygen partial pressures were approxi- mately equal and wereCited by: 7

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  • Decomposition of SF6 in an RF Plasma Environment

    2018-6-12SF6 clearly increased from 37.79 to 95.68% because of an increase in power from 5 to 20 W. When the power exceeded 40 W, η SF6 exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η SF6 was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygenCited by: 25

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  • MCVD工艺制备光纤(制造工艺)_图文_百度

    Translate this pagewenku.baidu.com›百度文库GeCl4, O2, He MCVD工艺反应机理 SiCl4+O2=SiO2+2Cl2 4POCl3+3O2=2P2O5+6Cl2 GeCl4+O2=GeO2+2Cl2 4BCl3+3O2=2B2O3+6Cl2 热泳效应 热泳现象是指在温度梯度不为零的气体或悬浮体中,粒子向较冷区域运动的现象。

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  • High rate etching of SiC using inductively coupled

    Inductively coupled plasma (ICP) reactive ion etching of SiC was investigated using SF6 plasmas. Etch rates were studied as a function of substrate bias voltage (−3 to −500 V), ICP coil power

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  • Thick benzocyclobutene etching using high density

    At 300 W and 50 mTorr, maximum etch rates of 0.7 and 0.6 μm/min are achieved at 30% and 20% fluorine composition for CF4 / O2 and SF6 / O2 plasmas, respectively.

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  • High-aspect-ratio deep Si etching in SF6/O2 plasma. II

    2021-2-12In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with SF6/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral etching in the upper regions of sidewalls. This lateral etching seems to depend on time (or etched depth) rather than aspect ratio

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  • /products-gis-gis/ -Sieyuan Electric Co., Ltd.

    2021-2-5ZF28A-72.5/126/145 type GIS is one of the latest generation of switch equipment developed by Shanghai Sieyuan high-voltage switchgear Co., Ltd. It obtains users’ trust because of its miniaturization design and reliable property. At present, the operation performance exists in most parts of domestic and overseas

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  • Etching mechanism of the single-step through-silicon

    2015-4-22Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry J. Vac. Sci. Technol. B 30, 06FF06 (2012); 10.1116/1.4758765 Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN and C6F5 J. Chem. Phys. 134, 044323

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  • SF6 Gas Detection For HV GIS Switchgear - Crowcon F

    2020-9-30SF6 Gas Detection For HV GIS Switchgear – Crowcon F-Gas Detector. Published 30 Sep 2020. The Rise, Risks Safe Detection Of SF6 Gas. 50 years ago ABB pioneered GIS

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  • Fluoronitrile/CO 2 mixture as an eco-friendly

    Recent studies suggest that fluoronitriles compound Novec 4710 possesses a dielectric strength two times higher than that of SF6, while with a low global warming potential of only 2400.

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  • FAQ on SF6_图文_百度文库

    Translate this pagewenku.baidu.com›百度文库›互联网Pure SF6 is physiologically completely harmless for humans and animals; it’s even used in medical treatment. Due to its weight it might displace the oxygen in the air, if large quantities are concentrating in deeper and non ventilated places. Legislation for

    Get Price
  • High-temperature etching of SiC in SF6/O2 inductively

    2020-11-17Camara, N. Zekentes, K. Study of the reactive ion etching of 6H–SiC and 4H–SiC in SF6/Ar plasmas by optical emission spectroscopy and laser interferometry. Solid-State Electron. 46 , 1959Cited by: 1

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  • Simulations of Si and SiO2 etching in SF6 + O2 plasma

    Chemical etching of Si and SiO 2 in SF 6 + O 2 plasma is considered. The concentrations of plasma components are calculated using values extrapolated from experimental data. Resulting calculations of plasma components are used for the calculation of Si and SiO 2 etching rates. It is found that the reaction constants forCited by: 10

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  • gas SF 6, gas sf 6 Suppliers and Manufacturers at

    A wide variety of gas sf6 gas options are available to you, such as electron grade, industrial grade. You can also choose from 2, 3 gas sf 6, as well as from vacuum, high voltage gas sf 6 There are 5,200 suppliers who

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  • Sieyuan Electric Co., Ltd. - Made-in-China.com

    Sieyuan Electric Co., Ltd. Originated from 1967, it is a well-known company in China (Stock code: 002028) which has been devoting in electric power technology research, equipment manufacturing and project services.

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  • MENU - Massachusetts Institute of Technology

    2020-9-16The type of etch gas (e.g. Cl2 vs BCl3, or SF6 vs CF4) and additional gases (e.g. Ar, O2, N2) can be critical for enabling certain types of etches over others. The mixing of fluorine and chlorine chemistries is strongly discouraged, as it can result in chamber hysteresis and irreproducible results.

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  • Reactive ion beam etching of Si/SiO2 systems using

    1990-12-2Applied Surface Science 46 (1990) 299-305 North-Holland 299 Reactive ion beam etching of S/S02 systems using SF6/OZ chemistry D. Korzec, T. Kessler and J. Engemann Uniuervity of Wuppertal, Department of Electrical Engineering, 5600 Wuppertal !, Fed. Rep. of Germany Received 29 May 1990;Cited by: 7

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  • NCMN NanoFab Equipment - RIE | Nanofabrication

    2021-3-14The Trion Minilock Phantom III RIE system is a plasma etch system with state-of-art plasma etch capability for single wafers, dies or parts. Accommodating up to six process gases (CF4, SF6, O2…

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  • NA1000MS SF6 Gas Leakage Monitoring

    Translate this pageRSS SF6 Sensor PGAS-32 Portable SF6 Gas Detector TGAS-1013 SF6 Gas Leakage Monitor NA1000MS SF6 Gas Leakage Monitoring System ZA-3502 SF6 Gas Dew Point Meter RA-912F SF6 Gas Analyzer NA1100P SF6 Gas Density Meter

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