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sf6 o2 tools KEPCO

sf6 o2 tools KEPCO

PLEASE NOTE: The following information suggests etch tools for specific materials. However, (this information) is not regularly updated. For up-to-date etch rates, please see specific tool pages. Si Deep Bosch Etch

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  • CDM: SF6 emission reductions in distribution part of

    SF6 emission reductions in distribution part of Korea Electric Power Corporation PDD appendices Appendix 1 - ER_Sheet_KEPCO(Public) (237 KB) Appendix 2 - IA_Sheet_KEPCO (340 KB) Please refer to our Further Information on SD-Tool: Host Parties Republic of Korea, involved indirectly approval (1168 KB

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  • SF6 decomposition multicomponent analysis system,SF6

    SF6 decomposition multicomponent analysis system,SF6 gas testing products,Products in the world,Beijing el technology co., LTD,Product model: SF6 - FTIR - 401Origin: Germany1. The SF6 features:Sulfur hexafluoride (SF6) gas, by two French chemist Mois

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  • KEPCO tools for railway - karina.net.pl

    Kepco Machine Tools offers Machine Tools in Naroda, Ahmedabad. You can also contact on 079-22840237. Get Price. Kepco KLP 75-33 Programmable DC Power Supply, 0 to 75. Kepco KLP 75-33 Programmable DC Power Supply, 0 to 75 V, 0 to 33 A. The Kepco KLP is a laboratory grade power supply in which the

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  • Cheap Sf6 Detection System Honeywell

    Welcome To Relations. SF6Relations (Henan) Co., Ltd. is a professional company focusing on research, production and sales of SF6 Tools, includ SF6 Monitoring Analysis equipment.SF6 Recyling Handling Equipment.SF6 On-site service and training.There is a place where you’ll get the Perfect SF6 solution for all your needs.

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  • Silicon columnar microstructures induced by an SF6/O2

    2005-9-2An inductively coupled SF 6 /O 2 plasma is used to form a columnar microstructure (CMS) on silicon samples cooled at very low temperature (~ −100 &C). The formation of this CMS is studied as a function of bias voltage, temperature, RF power and gas pressure. The characteristic mean diameter and mean height of the microstructure are evaluated by image processing tools

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  • Plasma etching of Si and SiO2 in SF6–O2 mixtures:

    1998-6-4The products of reaction and etch rates of Si and SiO 2 in SF 6 ‐O 2 plasmas have been studied as a function of feed composition in an alumina tube reactor at 27 mHz, 45 W, and 1

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  • Did anyone have experience in etching SiO2 with SF6 in

    The gasese we have are: SF6(0-100sccm), O2(0-20sccm), Ar(0-5sccm), and C4F8. my sample is 3um SiO2 deposited on the surface of Si wafer. The recipe I designed for 3um SiO2 etching is:A more typical silicon-oxide recipe from the semiconductor industry would be to use Ar/O2/C4F8:  80:10:10%. Using argon dilution boost the electron...Best answer 11Hi,I never used SF6 to etch SiO2 before coz SF6 is a bit toxic and it migh leave some residue over the etched samples. I suggest you use XPS or si...1We also use C4F8 as the chemically active component in RIE oxide etching. SF6 etches silicon much faster than SiO2, so as soon as you break through...2why dont you use HF for SiO2 etching.?it is more easy, fast and realiable 0oxide is a typical hard mask in ICP/DRIE etching.  Oxide is also used as an etch stop for SF6, such as if you have a oxide nitride stack, SF6 is a...0On our Panasonic ICP system, I developed the following recipe using a Chromium hard mask (not photoresist, which etches rather quickly in this SF6...0To my experience, yes solely SF6, etches SiO2 in ICP but I am not sure of the etch rate.0

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  • SF6及其混合气体临界击穿场强计算与特

    Translate this page文章信息/Info Title: Calculation and Characteristic Analysis of Critical Breakdown Field Strength of SF6 and the Mixtures 文章编号: 0253-987X(2013)02-0109-07 作者: 赵虎; 李兴文; 贾申利 西安交通大学电力设备电气绝缘国家重点实验室, 710049, 西安

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  • 不同气压对SF6热分解反应的作用机制研

    Translate this page唐 炬,黄秀娟,曾福平,等.微量O2对SF6过热分解组分形成过程的影响分析[J].中国电机工程学报,2015,35(10):2617-2624.TANG Ju,HUANG Xiujuan,ZENG Fuping,et al. Influence analysis of trace O2 on the

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  • 2 TFT_LCD Array Processs讲义0821_图

    Translate this pagewenku.baidu.com›百度文库›语言/资格考试2010-12-6SF6/HCl/O2 SiFx CF4/O2 N2 O2 CO ?i?? 405 337 450 25000 20000 Intensity (a.u.) Endpoint (A uto detect) A l-396nm 15000 10000 5000 Cl-726nm 0 0 20 40 60 80 Etch Time (sec) 100 120 Excellent Step Coverage Passivation S/D Metal Insulator Gate Glass [email protected]

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  • NNCI Site Tool Type Gases Application Wafer size

    2020-1-23NNCI Site Tool Type Gases Application Wafer size Cornell Plasmatherm. SF6, C4F8, O2, Ar: Deep silicon etch: 100mm Versaline ICP; Deep Ge etch DSEIII SOI; Cornell Unaxis 770 ICP; SF6, C4F8, O2, Ar Deep silicon etch; 100mm Mixed silicon etch 150mm; Release Cornell Ptherm 770 left chamber ICP; Cl2, BCl3, SF6, O2,

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  • China Sf6 Gas Analyzer, Sf6 Gas Analyzer Manufacturers

    China Sf6 Gas Analyzer manufacturers - Select 2021 high quality Sf6 Gas Analyzer products in best price from certified Chinese Test Equipment manufacturers, Testing Machine suppliers, wholesalers and factory on Made-in-China.com

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  • Etching mechanism of the single-step through-silicon

    2015-4-22Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry J. Vac. Sci. Technol. B 30, 06FF06 (2012); 10.1116/1.4758765 Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN and

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  • High-temperature etching of SiC in SF6/O2 inductively

    2020-11-17Camara, N. Zekentes, K. Study of the reactive ion etching of 6H–SiC and 4H–SiC in SF6/Ar plasmas by optical emission spectroscopy and laser interferometry. Solid-State Electron. 46 , 1959Cited by: 1

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  • 气体传感器产品_气体传感器品牌型号_气

    Translate this page传感器专家网提供[气体传感器]的参数、[气体传感器]应用、[气体传感器特征、[气体传感器]相关产品等内容 SW520是一款采用 NDIR 红外吸收检测原理的SF6气体传感器模组。在电力行业具有广泛应用,特别是在电力设备中,如高压断路器、变压器、互感器、电容器、避雷器、熔断器等。

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  • SF6-alternative gases discharge for sale

    SF6-alternative gases for application in gas-insulated. 6), which is the preferred gas for use in gas-insulated switchgear (circuit breakers, disconnect switches, etc. for high-voltage electrical circuits), has a very high global warming potential, and there is a large international effort to find alternative gases.

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  • Smart and Green Substations - IEEE

    2019-6-28THE KOREAN ELECTRIC POWER Corporation (KEPCO) has created a num-ber of initiatives for encouraging both green and smart energy in the global energy industry. With the aim of being a smart energy creator, KEPCO conducted RD for green and smart substations over the last 10 years, which will be

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  • Company Profile - D-Industrial - Company Profile

    1997-7-26Precise SF6 Measurement - D-Industrial Technology, Reliable to the End! We have. Ultra High Sensitivity SF6 Trace Gas Leak Detector. SF6 Multigas Analyzer. Laboratory Fume Hood Performance Testing Equipment and Software ( Approved for ASHRAE 110-2016 EN 14175-3 ) We serve for. High-Voltage

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  • The CORE Sequence: A Nanoscale Fluorocarbon-Free

    2020-1-8Lowering the substrate temperature below −80 &C improves the sidewall oxygen protection as the silicon oxy-fluoride reaction products start to freeze at the surface. 15 This method enables high silicon etch rates with a good directionality and is commonly known as cryo etching (Fig. 1 top). 16–20 However, the pattern

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  • High-aspect-ratio deep Si etching in SF6/O2 plasma. II

    2021-2-12In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with SF6/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral etching in the upper regions of sidewalls. This lateral etching seems to depend on time (or etched depth) rather than aspect ratio

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  • Sf6 gas Manufacturers Suppliers, China sf6-gas gas

    sf 6 gas manufacturer/supplier, China SF 6 gas manufacturer factory list, find qualified Chinese sf 6 gas manufacturers, suppliers, factories, exporters wholesalers quickly on Made-in-China.com.

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  • MENU - Massachusetts Institute of Technology

    2020-9-16The type of etch gas (e.g. Cl2 vs BCl3, or SF6 vs CF4) and additional gases (e.g. Ar, O2, N2) can be critical for enabling certain types of etches over others. The mixing of fluorine and chlorine chemistries is strongly discouraged, as it can result in chamber hysteresis and irreproducible results.

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  • General Etching Info - CNF User Wiki - Dashboard

    PLEASE NOTE: The following information suggests etch tools for specific materials. However, (this information) is not regularly updated. For up-to-date etch rates, please see specific tool pages. Si Deep Bosch Etch

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  • Low temperature etching of Si in high density plasma

    1995-2-1Low temperature etching of Si with SF 6 has been studied, using a DECR system and a special Helicon type plasma source. In contrast to the current understanding of low temperature etching, we did not observe a “freezing” of the lateral etching reaction, but obtained isotropic etch profiles, even at temperatures below −120& C. Anisotropic etch profiles are obtained by an addition of O

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  • STS ASE ICP DRIE – Fluorine | Core Facilities

    The STS ASE ICP DRIE – Fluorine is a load locked, inductively coupled plasma etch system. Process gases are SF6, C4F8, O2 and Ar. The system is for deep silicon etching using the Bosch process. Masks allowed in this system are photoresist and SiO2. This tool requires pre-requisite training on other techniques: Super User

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  • MENU - Massachusetts Institute of Technology

    2020-9-16C4H8, SF6, O2; Caution with: when etching through-wafer trenches, the wafer can break. It must be mounted on a 6 carrier wafer. Pieces and 4 wafers also need to be mounted on a carrier wafer. Machine Charges: 7/wafer + 0.04/um

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  • SAMCO 800iPB Deep RIE - Princeton University

    2018-7-18Tool owner: Eric Mills, [email protected], x 8‐6236 Backup: Joe Palmer, [email protected], x 8‐4706 Page 1 of 11 SAMCO 800iPB Deep RIE

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  • 气体传感器产品_气体传感器品牌型号_气

    Translate this page传感器专家网提供[气体传感器]的参数、[气体传感器]应用、[气体传感器特征、[气体传感器]相关产品等内容 BH551是一款采用NDIR红外吸收检测原理的气体传感器模组,根据一氧化氮气体在5.32um的吸收量和二氧化氮在6.42um的吸收量确定浓度大小。

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  • SF6 serviços laboratory

    sf6 gas-gas storage kepco. KEPCO plans to take the lead in the SF6 Emission Reduction CDM Our appliion covers electric power, laboratory fume hood, building ventilation, mine. Get Price. CHINT Transformer Laboratory received CNAS certificate.

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  • OA-1S+ Portable Trace Oxygen Analyzer - Bacharach, Inc.

    Description. The Neutronics Model OA-1S+ is a Portable Trace Oxygen Analyzer accurately measures oxygen in the range of 75 ppb to 100%. Featuring the Neutronics rapid response zirconium oxide sensor with its extremely fast response and high accuracy, the Model OA-1S+ can be exposed to air and quickly read ppb oxygen

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